Everything You Need to Know about Sputtering Targets
Everything You Need to Know about Sputtering Targets
What are Sputtering Targets?
The term "target" in "sputtering target" is derived from the concept of a shooting target, familiar to all of us. In the physical vapor deposition (PVD) process, the coating material is bombarded by an electron beam or ion beam, similar to how a target is shot, which is how this material gets its name. Understanding the origin of the term makes "sputtering target" seem less peculiar.
Heeger Materials Inc. is a leading supplier and manufacturer of high-quality sputtering targets, including tantalum (Ta), antimony (Sb), ITO, gadolinium (Gd), and chromium (Cr) sputtering targets, among others. We leverage extensive expertise in supply and export to offer competitive prices. Customized solutions are available to meet specific requirements, ensuring exceptional quality and customer satisfaction. You can confidently purchase sputtering targets from Heeger Materials Inc.
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Different Types of Sputtering Targets
Sputtering targets encompass a broad range of categories, including metal, alloy, and ceramic sputtering targets. Practically any material, such as alloys, mixtures, pure metals, oxides, nitrides, borides, or carbides, can serve as a sputter target.
Sputtering Target Types:
- Metal Targets
- Pure Metal Targets: Composed of a single metal, such as aluminum (Al), copper (Cu), or nickel (Ni).
- Alloy Targets: Composed of two or more metals, such as titanium-aluminum alloy (TiAl) or copper-aluminum alloy (CuAl).
- Oxide Targets
- Oxides: Includes aluminum oxide (Al2O3), titanium dioxide (TiO2), and more.
- Nitrides: Examples include aluminum nitride (AlN) and silicon nitride (Si3N4).
- Carbide Targets
- Silicon Carbide (SiC): Used for high-temperature resistant materials.
- Tungsten Carbide (WC): Employed to create wear-resistant materials.
- Boride Targets
- Silicon Boride (BSi): Used for semiconductor materials.
- Magnetic Material Targets
- Iron (Fe): Utilized for magnetic recording media and sensors.
- Nickel Iron (NiFe): Used in magnetic storage devices.
- Semiconductor Material Targets
- Silicon (Si): Integral in integrated circuit manufacturing.
- Germanium (Ge): Applied in infrared optical devices.
Applications of Sputtering Targets
Sputtering targets have a wide range of applications, including flat panel displays, optical components, energy-efficient glass, semiconductors, and solar cells. They are utilized for the preparation of magnetic materials, decorative coatings, protective coatings, and conductive films, serving industries that require high performance and quality.
Manufacturing Process of Sputtering Target Materials
Heeger Materials Inc. employs advanced manufacturing technologies to produce sputtering target materials. Sputtering targets are essential in the PVD process, which coats thin films onto various surfaces. Our manufacturing process includes melting, sintering, synthesis, and machining to cater to different materials, purities, and shapes. The selection of the manufacturing process is based on the material characteristics and its intended application.
We utilize state-of-the-art powder mixing and/or alloying through sintering and/or melting of raw materials, followed by grinding to meet rigorous quality standards. Each production batch undergoes various analytical processes, and a certificate of analysis accompanies each shipment.
The grain structure is a critical factor in the performance of sputtering targets. Finer grain sizes minimize variation in film uniformity and deposition rates, while random or equiaxed grain orientation enhances film uniformity. Effective control of the grain structure enables more consistent and higher-yielding deposition processes.
We offer a variety of advanced manufacturing methods to produce sputtering targets with excellent grain structures and a diverse portfolio of sputtering target materials in almost any shape or size. Please reach out if your desired sputtering target material or purity is not listed.
Where to Buy Sputtering Targets in Bulk
Heeger Materials Inc. is a trusted supplier and manufacturer of high-quality sputtering target materials. We offer competitive prices and customized solutions to meet specific requirements, ensuring exceptional quality and customer satisfaction. You can confidently purchase sputtering targets from Heeger Materials Inc.
What Are the Applications of Sputtering Targets? (With Video)
Sputtering targets serve as a vital mechanism in physical vapor deposition (PVD), with numerous applications in modern technology and manufacturing.
In the sputtering process, atoms are extracted from the sputter target using powerful magnets, while a controlled gas (typically argon) is introduced. The gas atoms collide in their gaseous state, forming a plasma that condenses into a thin film on the substrate.
Additional reading:92 Series UPVC Profiles
Advanced Targets Product Page
Many commonly used products today feature coatings created through sputtering materials. These coatings include:
Glass Coating
Sputter coater targets are instrumental in producing low-radiation coated glass (Low-E glass), widely used in construction due to their energy-saving and aesthetic properties.
Optical Coating
Optical coatings are prevalent in applications such as sunglasses, eyeglasses, vehicle headlights, mirrors, windows, and optic filters for laser technology.
Solar Cell Coating
With growing demands for renewable energy, thin-film solar cells are increasingly produced using sputter coating technology. The cadmium telluride sputtering target (CIGS target) captures a significant share of the solar market.
Semiconductors
Modern electronics incorporate essential components that utilize tantalum sputtering targets, including microchips, memory chips, print heads, and flat panel displays.
Heeger Materials Inc. is the world’s top supplier of titanium sputtering targets. We are your one-stop shop for all your needs, with a highly specialized staff ready to assist you in finding the right product.
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